Tribology In Chemical-Mechanical Planarization by David Craven, Hong Liang

Tribology In Chemical-Mechanical Planarization

David Craven, Hong Liang

200 pages missing pub info (editions)

nonfiction technology informative medium-paced
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The role that friction and contact play in the processes of wear and planarization on material surfaces is central to the understanding of Chemical-Mechanical planarization (CMP) technology, particularly when applied to nanosurfaces. Tribology in ...

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