Stress Induced Voiding & Electromigration Analysis of Cu-Cu bonds by Harjinder Singh, Amandeep Singh Sappal, Manvinder Sharma

Stress Induced Voiding & Electromigration Analysis of Cu-Cu bonds

Harjinder Singh, Amandeep Singh Sappal, Manvinder Sharma

60 pages missing pub info (editions)

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Face to Face Stacking on Wafer to Wafer (WoW) can be done for the Cu-Cu direct bonding interconnects. A good mechanical strength to sustain shear force during thinning can be achieved by Cu bonding. While making reliable interconnect structures ha...

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